Equipment Type:

Cleanroom Instrumentation

Lithography

Nano and Micro Fabrication

Information the Equipment Can Provide

The Suss MA6 mask aligner provides several modes of contact that can be selected when exposing a photoresist coated wafer to the UV light source. Contact can be light, heavy or vacuum assisted. Additionally, the user may expose with no contact at all using special mask holders equipped with precision machined stand-off flags. The 350W lamp provides even illumination with computer-controlled intensity modulation to produce reliable exposures.

Features

• Lithography feature resolution of 1 μm readily achieved
• Mask holders for 4″, 5″ and 7″ square masks
• Substrate holders for 3, 4- and 6-inch wafers
• Substrate thickness up to 0.25″ allowed
• Exposures at 365 (i-line) and 405 nm (h-line).
• Only top side alignment available

Fees and Policies

• UT Users: $31/hour
• Higher Education/State Agencies: $54/hour
• Corporate/External Users: $46/hour

To become a new user of this facility, please read the Instrument Reservation Information page. If you are already a user you can make a reservation in FBS.

To become a user of this instrument you must first complete the Cleanroom Safety Class. Please contact the facility manager to schedule a training session.