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Oxford Instruments Plasma Lab 80+ PECVD and Etching

Contact: Dr. Raluca Gearba
Email:
Location: FNT 4.106

Equipment Type:

Cleanroom Instrumentation

Nano and Micro Fabrication

Plasma Etching and Material Growth

Instrument Capabilities

The Oxford PlasmaLab 80 is a versatile plasma-processing system that combines etching and thin-film deposition in one tool. It can perform high-aspect-ratio silicon etching using either Bosch (gas-chopping) or cryogenic processes. The system can also deposit high-quality silicon dioxide, silicon nitride, and oxynitride films at room temperature, making it suitable for temperature-sensitive plastic and organic substrates. It accommodates wafers up to 8 inches, with processing concentrated in the central 4-inch region of the chamber.

Technical Specifications
Available gases:

  • N₂, N₂O, O₂, SF₆, and Ar: maximum flow rate of 100 sccm
  • C₄F₈, SiH₄, and CH₄: maximum flow rate of 20 sccm
  • RF power: 300 W
  • ICP power: 300 W
  • Process pressure: 4–100 mTorr
  • Substrate temperature: Controllable from −150 to 200 °C
  • Capabilities: Supports both material growth (deposition) and plasma etching

The wide range of available process gases, combined with independently controlled RF and ICP power, pressure control, and a broad substrate-temperature range, provides significant flexibility for developing both etching and thin-film deposition processes.

System Characteristics:

  • Available gases:
    • N2, N2O, O2, SF6, Ar with max flow of 100 sccm
    • C4F8, SiH4, CH4 with max flow of 20 sccm
  • Power: 300W RF and 300W ICP
  • Process Pressure from 4 to 100 mTorr
  • Temperature substrate can be controlled from -150 to 200C.
  • Can be used for both materials growth and etching

Fees and Policies

Cleanroom Entry fee: (The cleanroom entry fee is charged in addition to the cleanroom facility usage fee)

  • UT Users: $6
  • Higher Education/State Agencies: $10
  • Corporate/External Users: $10

Cleanroom Facility

  • UT Users: $35/hour
  • Higher Education/State Agencies (Assisted): $92/hour
  • Corporate/External Users (Assisted): $94/hour
  • Higher Education/State Agencies (Unassisted): $64/hour
  • Corporate/External Users (Unassisted): $65/hour

Please contact Dr. Raluca Gearba and/or James Smitherman to schedule a training session.