Information the Equipment Can Provide

Coming Soon

Fees and Policies

• UT Users: TBD/hour
• Higher Education/State Agencies: TBD/hour
• Corporate/External Users: TBD/hour

To become a new user of this facility, please read the Instrument Reservation Information page. If you are already a user you can make a reservation in FBS.

Information the Equipment Can Provide

The JEOL 2010F is a high-resolution transmission electron microscope.

Key Features

• Lattice Imaging (HRTEM)
• Elemental identification and mapping (EDXS and EELS)
• Electronic state identification and mapping (EELS)
• Magnetic and electronic field mapping (Electron Holography)
• Phase and orientation identification/mapping with 1 – 2 nm resolution (Diffraction – STEM)
• Automated phase and orientation mapping (Precession Electron Diffraction) – similar to EBSD but with a resolution of ~ 5 nm
• In-situ heating and biasing

Specifications

• Imaging Modes: TEM/STEM
• Voltage: 120/200 KV
• Cs: 0.5 mm
• Point to Point Resolution: 0.19 nm
• Focused Probe: 0.2 nm
• Source: Schottky Field Emission
• Tilt Range: 15°

Attached Equipment

• Gatan OneView Camera with IS software
• Silicon Drift EDS Detector
• EELS Detector
• Bi-prism
• ASTAR Precession Electron Diffraction
• Double-Tilt Holder
• Protochips Heating/Biasing Holder

Fees and Policies

• UT Users: $41/hour
• Higher Education/State Agencies: $137/hour
• Corporate/External Users: $137/hour

To become a new user of this facility, please read the Instrument Reservation Information page. If you are already a user you can make a reservation in FBS.

Instrument Capabilities

Ultra-high-resolution mass spectrometry (up to 0.001 a.m.u.).

Surface and bulk chemical composition (mass range up to 14,000 a.m.u., elemental sensitivity as high as parts-per-billion and surface sensitivity of a few atomic layers).

Key Feature:

• Surface Spectroscopy:
  • elemental and molecular information
  • ppm to ppb elemental sensitivity
  • < 1 nm surface sensitivity
  • >10000 mass resolution (m/δm)
  • mass range up 14000 a.m.u.
• Surface Imaging:
  • lateral resolution < 100 nm
  • parallel mass detection
• Depth Profiling:
  • depth resolution < 1 nm
  • thin films from < 1 nm to few hundreds μm
• 3D Analysis:
  • high depth resolution
  • high lateral resolution
  • parallel mass detection
• Retrospective Data Analysis:
  • complete data recording (mass, position and intensity)
  • data can be revisited anytime for additional analysis without further sample analysis
• Air-free Sample Transfer Capability:
  • air-free capsule available for sample transfer to and from user glove boxes

Accepted Samples: metals, semiconductors, insulators, organic or inorganic, in solid or powder (needs to be pressed) form

Available Sputtering Species:

• Analysis Species: Bi₁⁺(30 kV), Bi₃⁺(30 kV), Bi₃⁺⁺ (60 kV), C₆₀⁺ (20 kV), C₆₀⁺⁺ (40 kV), C₆₀⁺⁺⁺ (60 kV)
• Sputtering Species: Cs⁺or O₂⁺(250 V to 2 kV), C₆₀⁺ (20 kV), C₆₀⁺⁺ (40 kV), C₆₀⁺⁺⁺ (60 kV)

The TOF-SIMS is also equipped with a set of chambers and a capsule (collectively called Rox interface) to transfer air sensitive samples from an argon (or nitrogen) filled glove box to the surface analysis chamber, which is under ultra-high vacuum (UHV). The Rox Interface was designed and developed at the Texas Materials Institute (U.S. Patent Application Serial No. 14/445,650 filed July 29, 2014). Unlike commercial interfaces, the Rox interface was designed with a unique innovation, which is that it has a built-in semi-quantitative method to monitor sample transfer reliability and validity.

Additional information on this equipment.

Fees and Policies

• UT Users: $25/hour
• Higher Education/State Agencies: $44/hour
• Corporate/External Users: $44/hour

Traning

Please contact Dr. Andrei Dolocan to schedule a training session.